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1

Image sharpness measurement in scanning electron microscopy—part I

M. L. T. Chae Postek, András E. Vladár

Journal:

Year:

1998

Language:

english

File:

PDF, 699 KB

english, 1998

2

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, USA (Sunday 21 August 2011)] Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors V - Strategies for nanoscale contour metrology using critical dimension atomic force microscopy

Orji, Ndubuisi G., Postek, Michael T., Dixson, Ronald G., Vládar, András E., Postek, Michael T.

Year:

2011

Language:

english

File:

PDF, 755 KB

english, 2011

3

Contour metrology using critical dimension atomic force microscopy

Orji, Ndubuisi G., Dixson, Ronald G., Ng, Boon Ping, Vladár, András E., Postek, Michael T.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2016

Language:

english

File:

PDF, 3.31 MB

english, 2016

4

Image sharpness measurement in the scanning electron microscope—Part III

Nien Fan Zhang, Michael T. Postek, Robert D. Larrabee, András E. Vladár, William J. Keery, Samuel N. Jones

Journal:

Year:

1999

Language:

english

File:

PDF, 1.02 MB

english, 1999

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Reference material (RM) 8820: a versatile new NIST standard for nanometrology

Postek, Michael T., Raymond, Christopher J., Vladar, Andras E., Keery, William, Bishop, Michael, Bunday, Benjamin, Allgair, John

Year:

2010

Language:

english

File:

PDF, 3.58 MB

english, 2010

6

Effects of wafer noise on the detection of 20-nm defects using optical volumetric inspection

Barnes, Bryan M., Goasmat, Francois, Sohn, Martin Y., Zhou, Hui, Vladár, András E., Silver, Richard M.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2015

Language:

english

File:

PDF, 5.15 MB

english, 2015

7

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California (Sunday 1 August 2010)] Instrumentation, Metrology, and Standards for Nanomanufacturing IV - Multipurpose instrument calibration standard for particle beam, scanned probe and optical microscopy: NIST reference material (RM) 8820

Postek, Michael T., Postek, Michael T., Vladar, András E., Keery, William, Bishop, Michael, Bunday, Benjamin, Allgair, John

Year:

2010

Language:

english

File:

PDF, 3.58 MB

english, 2010

8

Image sharpness measurement in scanning electron microscopy—part II

Andrá E. Vladár, Michael T. Postek, Mark. P. Davidson

Journal:

Year:

1998

Language:

english

File:

PDF, 1.21 MB

english, 1998

9

Modeling for accurate dimensional scanning electron microscope metrology: then and now

Michael T. Postek, András E. Vladár

Journal:

Year:

2011

Language:

english

File:

PDF, 490 KB

english, 2011

10

SPIE Proceedings [SPIE SPIE Nanoscience + Engineering - San Diego, California, United States (Sunday 9 August 2015)] Nanoengineering: Fabrication, Properties, Optics, and Devices XII - Nanomanufacturing concerns about measurements made in the SEM part IV: charging and its mitigation

Campo, Eva M., Dobisz, Elizabeth A., Eldada, Louay A., Postek, Michael T., Vladár, András E.

Year:

2015

Language:

english

File:

PDF, 403 KB

english, 2015

11

Digital imaging for scanning electron microscopy

Michael T. Postek, András E. Vladár

Journal:

Year:

1996

Language:

english

File:

PDF, 1.61 MB

english, 1996

12

Inexpensive digital imaging?

Michael T. Postek, Andras E. Vladar

Journal:

Year:

1997

Language:

english

File:

PDF, 842 KB

english, 1997

13

Application of the low-loss scanning electron microscope image to integrated circuit technology. Part 1– applications to accurate dimension measurements

Michael T. Postek, András E. Vladár, Oliver C. Wells, Jerry L. Lowney

Journal:

Year:

2001

Language:

english

File:

PDF, 281 KB

english, 2001

14

Application of the low-loss scanning electron microscope image to integrated circuit technology. Part II— chemically-mechanically planarized samples

Oliver C. Wells, Maurice McGlashan-Powell, András E. Vladár, Michael T. Postek

Journal:

Year:

2001

Language:

english

File:

PDF, 1.49 MB

english, 2001

15

Development of the metrology and imaging of cellulose nanocrystals

Postek, Michael T, Vladár, András, Dagata, John, Farkas, Natalia, Ming, Bin, Wagner, Ryan, Raman, Arvind, Moon, Robert J, Sabo, Ronald, Wegner, Theodore H, Beecher, James

Journal:

Measurement Science and Technology

Year:

2011

Language:

english

File:

PDF, 2.57 MB

english, 2011

16

Oliver C. Wells' Vision: Use of Low-Loss Electrons to Enhance and Measure the Surface Detail in the Scanning Electron Microscope at High Resolution

Postek, Michael T., Vladar, Andras E., Ming, Bin

Journal:

Microscopy and Microanalysis

Year:

2014

Language:

english

File:

PDF, 1.11 MB

english, 2014

17

Calibrating image roughness by estimating Lipschitz exponents, with applications to image restoration

Vladár, András E.

Journal:

Optical Engineering

Year:

2008

Language:

english

File:

PDF, 1.49 MB

english, 2008

18

SPIE Proceedings [SPIE NanoScience + Engineering - San Diego, CA (Sunday 10 August 2008)] Instrumentation, Metrology, and Standards for Nanomanufacturing II - Cellulose nanocrystals the next big nano-thing?

Postek, Michael T., Vladar, Andras, Dagata, John, Farkas, Natalia, Ming, Bin, Sabo, Ronald, Wegner, Theodore H., Beecher, James, Postek, Michael T., Allgair, John A.

Year:

2008

Language:

english

File:

PDF, 4.88 MB

english, 2008

19

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - 10nm three-dimensional CD-SEM metrology

Cain, Jason P., Sanchez, Martha I., Vladár, András E., Villarrubia, John S., Chawla, Jasmeet, Ming, Bin, Kline, Joseph R., List, Scott, Postek, Michael T.

Year:

2014

Language:

english

File:

PDF, 2.23 MB

english, 2014

20

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Determination of optimal parameters for CD-SEM measurement of line-edge roughness

Bunday, Benjamin D., Bishop, Michael, McCormack, Jr., Donald W., Villarrubia, John S., Vladar, Andras E., Dixson, Ronald, Vorburger, Theodore V., Orji, N. G., Allgair, John A., Silver, Richard M.

Year:

2004

Language:

english

File:

PDF, 509 KB

english, 2004

21

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Simulation study of repeatability and bias in the CD-SEM

Villarrubia, John S., Vladar, Andras E., Postek, Michael T., Herr, Daniel J.

Year:

2003

Language:

english

File:

PDF, 930 KB

english, 2003

22

Optimizing hybrid metrology: rigorous implementation of Bayesian and combined regression

Henn, Mark-Alexander, Silver, Richard M., Villarrubia, John S., Zhang, Nien Fan, Zhou, Hui, Barnes, Bryan M., Ming, Bin, Vladár, András E.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2015

Language:

english

File:

PDF, 4.64 MB

english, 2015

23

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Proximity-associated errors in contour metrology

Villarrubia, John S., Raymond, Christopher J., Dixson, Ronald G., Vladár, András E.

Year:

2010

Language:

english

File:

PDF, 1.30 MB

english, 2010

24

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - Contour metrology using critical dimension atomic force microscopy

Orji, Ndubuisi G., Dixson, Ronald G., Vladár, András E., Ming, Bin, Postek, Michael T., Starikov, Alexander

Year:

2012

Language:

english

File:

PDF, 1.32 MB

english, 2012

25

[ACM Press the 2016 - Denver, Colorado, USA (2016.07.20-2016.07.24)] Proceedings of the 2016 on Genetic and Evolutionary Computation Conference Companion - GECCO '16 Companion - An Attractor Network-Based Model with Darwinian Dynamics

de Vladar, Harold P., Fedor, Anna, Szilágyi, András, Zachar, István, Szathmáry, Eörs

Year:

2016

Language:

english

File:

PDF, 2.31 MB

english, 2016

26

Cognitive Architecture with Evolutionary Dynamics Solves Insight Problem

Fedor, Anna, Zachar, István, Szilágyi, András, Öllinger, Michael, de Vladar, Harold P., Szathmáry, Eörs

Journal:

Frontiers in Psychology

Year:

2017

Language:

english

File:

PDF, 1.98 MB

english, 2017

27

Advanced metrology needs for nanoelectronics lithography

Stephen Knight, Ronald Dixson, Ronald L. Jones, Eric K. Lin, Ndubuisi G. Orji, R. Silver, John S. Villarrubia, András E. Vladár, Wen-li Wu

Journal:

Comptes Rendus Physique

Year:

2006

File:

PDF, 987 KB

2006

28

Helium ion microscopy and its application to nanotechnology and nanometrology

Michael T. Postek, Andras E. Vladár

Journal:

Year:

2008

Language:

english

File:

PDF, 385 KB

english, 2008

29

Is your scanning electron microscope Hi-Fi?

András E. Vladár, Michael T. Postek, Scott D. Davilla

Journal:

Year:

1995

Language:

english

File:

PDF, 492 KB

english, 1995

30

Time-lapse scanning electron microscopy for measurement of contamination rate and stage drift

András E. Vladár

Journal:

Year:

1999

Language:

english

File:

PDF, 1.93 MB

english, 1999

31

Two-dimensional simulation and modeling in scanning electron microscope imaging and metrology research

Michael T. Postek, András E. Vladár, Jeremiah R. Lowney, William J. Keery

Journal:

Year:

2002

Language:

english

File:

PDF, 501 KB

english, 2002

32

New application of variable-pressure/environmental microscopy to semiconductor inspection and metrology

Michael T. Postek Jr., András E. Vladár

Journal:

Year:

2004

Language:

english

File:

PDF, 913 KB

english, 2004

33

Nanotip electron gun for the scanning electron microscope

AndráS E. Vladár, Zsolt Radi, Michael T. Postek, David C. Joy

Journal:

Year:

2006

Language:

english

File:

PDF, 2.03 MB

english, 2006

34

Modification of a commercial SEM with a computer controlled cathode stabilized power supply

Michael T. Postek, William J. Keery, Andras E. Vladar

Journal:

Year:

1993

Language:

english

File:

PDF, 273 KB

english, 1993

35

Real-Time Scanning Charged-Particle Microscope Image Composition with Correction of Drift

Cizmar, Petr, Vladár, András E., Postek, Michael T.

Journal:

Microscopy and Microanalysis

Year:

2011

Language:

english

File:

PDF, 524 KB

english, 2011

36

Does your SEM Really tell the truth?-how would you know? Part 1

Postek, Michael T., Vladár, András E.

Journal:

Year:

2013

Language:

english

File:

PDF, 267 KB

english, 2013

37

SPIE Proceedings [SPIE SPIE Defense, Security, and Sensing - Baltimore, Maryland, USA (Monday 23 April 2012)] Scanning Microscopies 2012: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences - Does your SEM really tell the truth?

Postek, Michael T., Vladár, András E.

Year:

2012

Language:

english

File:

PDF, 3.51 MB

english, 2012

38

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - Contamination specification for dimensional metrology SEMs

Vladár, András E., Purushotham, K. P., Postek, Michael T., Allgair, John A., Raymond, Christopher J.

Year:

2008

Language:

english

File:

PDF, 2.02 MB

english, 2008

39

Nanostructure Fabrication by Ultra-High-Resolution Environmental Scanning Electron Microscopy

Toth, Milos, Lobo, Charlene J., Knowles, W. Ralph, Phillips, Matthew R., Postek, Michael T., Vladár, András E.

Journal:

Year:

2007

Language:

english

File:

PDF, 476 KB

english, 2007

40

SPIE Proceedings [SPIE SPIE Defense, Security, and Sensing - Baltimore, Maryland, USA (Monday 29 April 2013)] Scanning Microscopies 2013: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences - Does your SEM really tell the truth? Part 2

Postek, Michael T., Vladár, András E., Purushotham, Kavuri P., Postek, Michael T., Newbury, Dale E., Platek, S. Frank, Maugel, Tim K.

Year:

2013

Language:

english

File:

PDF, 438 KB

english, 2013

41

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Inverse scattering approach to SEM linewidth measurements

Davidson, Mark P., Vladar, Andras E., Singh, Bhanwar

Year:

1999

Language:

english

File:

PDF, 1.12 MB

english, 1999

42

Does your SEM really tell the truth? How would you know? Part 2

Postek, Michael T., Vladár, András E., Purushotham, Kavuri P.

Journal:

Year:

2014

Language:

english

File:

PDF, 1.37 MB

english, 2014

43

Spectral density-based statistical measures for image sharpness

Zhang, Nien Fan, Vladar, Andras E, Postek, Michael T, Larrabee, Robert D

Journal:

Year:

2005

Language:

english

File:

PDF, 913 KB

english, 2005

44

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - Nanoparticle size and shape evaluation using the TSOM method

Damazo, Bradley, Attota, Ravikiran, Kavuri, Purushotham, Vladár, András E., Starikov, Alexander

Year:

2012

Language:

english

File:

PDF, 575 KB

english, 2012

45

Particle size distributions by transmission electron microscopy: an interlaboratory comparison case study

Rice, Stephen B, Chan, Christopher, Brown, Scott C, Eschbach, Peter, Han, Li, Ensor, David S, Stefaniak, Aleksandr B, Bonevich, John, Vladár, András E, Walker, Angela R Hight, Zheng, Jiwen, Starnes, C

Journal:

Year:

2013

Language:

english

File:

PDF, 924 KB

english, 2013

46

[IEEE 2011 IEEE 11th International Conference on Nanotechnology (IEEE-NANO) - Portland, OR, USA (2011.08.15-2011.08.18)] 2011 11th IEEE International Conference on Nanotechnology - Accurate nanometer-scale imaging and measurements with SEM

Damazo, Bradley N., Ming, Bin, Purushotham, Premsagar K., Vladar, Andras E., Postek, Michael T.

Year:

2011

Language:

english

File:

PDF, 905 KB

english, 2011

47

New insights into subsurface imaging of carbon nanotubes in polymer composites via scanning electron microscopy

Zhao, Minhua, Ming, Bin, Kim, Jae-Woo, Gibbons, Luke J, Gu, Xiaohong, Nguyen, Tinh, Park, Cheol, Lillehei, Peter T, Villarrubia, J S, Vladár, András E, Alexander Liddle, J

Journal:

Year:

2015

Language:

english

File:

PDF, 3.37 MB

english, 2015

48

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Potentials for high pressure/environmental SEM microscopy for photomask dimensional metrology

Postek, Michael T., Vladar, Andras E., Rice, Trisha M., Knowles, Ralph, Herr, Daniel J.

Year:

2003

Language:

english

File:

PDF, 602 KB

english, 2003

49

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Optical volumetric inspection of sub-20nm patterned defects with wafer noise

Cain, Jason P., Sanchez, Martha I., Barnes, Bryan M., Goasmat, Francois, Sohn, Martin Y., Zhou, Hui, Vladár, András E., Silver, Richard M., Arceo, Abraham

Year:

2014

Language:

english

File:

PDF, 4.37 MB

english, 2014

50

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Metrology, Inspection, and Process Control for Microlithography X - High-accuracy critical-dimension metrology using a scanning electron microscope

Lowney, Jeremiah R., Vladar, Andras E., Postek, Jr., Michael T., Jones, Susan K.

Year:

1996

Language:

english

File:

PDF, 494 KB

english, 1996

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